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Nanoscale Characterization and Impurities of Fused Silica Optical Surfaces

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成果类型:
期刊论文
作者:
Dai, Zuocai;Zhou, Sha;Huang, Zhiliang;Li, Hao
通讯作者:
Dai, Zuocai(daizuocai@hncu.edu.cn)
作者机构:
[Huang, Zhiliang; Li, Hao; Dai, Zuocai] Hunan City Univ, Coll Mech & Elect Engn, Yiyang 413002, Hunan, Peoples R China.
[Huang, Zhiliang; Dai, Zuocai] Key Lab Energy Monitoring & Edge Comp Smart City H, Yiyang 413002, Hunan, Peoples R China.
[Zhou, Sha] Hunan City Univ, Yiyang 413002, Hunan, Peoples R China.
通讯机构:
[Dai, Z.] C
College of Mechanical and Electrical Engineering, Hunan City University, Hunan, Yiyang, China
语种:
英文
期刊:
Advances in Materials Science and Engineering
ISSN:
1687-8434
年:
2022
卷:
2022
基金类别:
Project of Natural Science Foundation of Hunan Province [2021JJ40027]; Scientific Research Project of Hunan Education Department [20B113]
机构署名:
本校为第一机构
院系归属:
机械与电气工程学院
摘要:
Fused silica is produced by melting high-purity silica and then rapidly cooling it. It has good physical and chemical properties, which also make it the raw material for most components in the optical industry, and is widely used in optical fiber communications, semiconductors, and aerospace. The content of SiO2 in fused silica is as high as 99.995% or more, but some impurities will still be generated during production and processing. The impurity elements of its optical curved surface can induce damage to the fused silica and adversely affect ...

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