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Atomic origin of the traps in memristive interface

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成果类型:
期刊论文
作者:
Tian, Ye;Pan, Lida;Guo, Chuan Fei;Liu, Qian*
通讯作者:
Liu, Qian
作者机构:
[Liu, Qian; Tian, Ye] Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, CAS Ctr Excellence Nanosci, 11 Beiyitiao, Beijing 100190, Peoples R China.
[Tian, Ye] Hunan City Univ, Sch Commun & Elect Engn, Yiyang 413000, Peoples R China.
[Pan, Lida] Vanderbilt Univ, Dept Phys & Astron, Nashville, TN 37235 USA.
[Pan, Lida] Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China.
[Tian, Ye] Univ Ghent, IMEC, Dept Informat Technol, Photon Res Grp, B-9000 Ghent, Belgium.
通讯机构:
[Liu, Qian] N
Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, CAS Ctr Excellence Nanosci, 11 Beiyitiao, Beijing 100190, Peoples R China.
语种:
英文
关键词:
memristance;interface;trap state;first principle calculation
关键词(中文):
陷阱;原子;接口;电子能量损失谱;起源;开关器件;第一原理计算
期刊:
纳米研究:英文版
ISSN:
1998-0124
年:
2017
卷:
10
期:
6
页码:
1924-1931
基金类别:
National Key Research Program of China [2016YFA0200403]; National Natural Science Foundation of ChinaNational Natural Science Foundation of China (NSFC) [10974037, 11547163]; CAS Strategy Pilot program [XAD 09020300]; Hunan Provincial Natural Science Foundation of ChinaNatural Science Foundation of Hunan Province [2015JJ6015]; Science and technology project of Yiyang [2015JZ29]; China Scholarship Council (CSC)China Scholarship Council [201508430266]
机构署名:
本校为其他机构
院系归属:
信息与电子工程学院
摘要:
In recent years, trap-related interfacial transport phenomena have received great attention owing to their potential applications in resistive switching devices and photo detectors. Not long ago, one new type of memristive interface that is composed of F-doped SnO_2 and Bi_2S_3 nano-network layers has demonstrated a bivariate-continuous-tunable resistance with a swift response comparable to the one in neuron synapses and with a brain-like memorizing capability. However, the resistive mechanism is still not clearly understood because of lack of evidence, and the limited improvement in the devel...
摘要(中文):
在最近的年里,陷井相关的界面的运输现象在抵抗切换的设备和相片察觉者由于他们的潜在的应用程序收到了大注意。不很久以前,由做 F 的 SnO 2 和双性人 2 S 3nano 网络层在神经原触处并且与一个像大脑的记住能力与比得上那的快速的回答表明了一个 bivariate-continuous-tunable 电阻。然而,因为证据,和有限改进的缺乏,抵抗机制仍然不清楚地在界面的设备的发展被理解。由联合 I-V 描述,电子精力损失光谱学,和第一原则的计算,我们详细用试验性、理论的方法学习了 memristive 接口的 macro/micro 特征,并且证实它的原子起源被归因于做 O 导致的陷井。这暗示做杂质的力量是为改进切换的特征...

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